Blackman, CS;
Carmalt, CJ;
O'Neill, SA;
Parkin, IP;
Apostolico, L;
Moloy, KC;
(2003)
Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine.
Applied Surface Science
, 211
(1-4)
2 - 5.
10.1016/S0169-4332(03)00263-0.
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Abstract
Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented.
| Type: | Article |
|---|---|
| Title: | Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1016/S0169-4332(03)00263-0 |
| Publisher version: | http://dx.doi.org/10.1016/S0169-4332(03)00263-0 |
| Language: | English |
| Additional information: | © 2003 Elsevier Science BV |
| Keywords: | CVD, thin film, titanium phosphide, tristrimethylsilylphosphine, TRANSITION-METAL PHOSPHIDES, CRYSTAL-STRUCTURES, FILMS, TEMPERATURE, PRECURSOR, SPECTRA, ROUTES, GLASS, TICL4 |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery-pp.ucl.ac.uk/id/eprint/143122 |
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