Moniz, SJA;
Blackman, CS;
Carmalt, CJ;
Hyett, G;
(2010)
MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water.
J MATER CHEM
, 20
(36)
7881 - 7886.
10.1039/c0jm01720e.
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Abstract
Bismuth(III) tert-butoxide [Bi((OBu)-Bu-t)(3)] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (E-g = 2.3-3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.
| Type: | Article |
|---|---|
| Title: | MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1039/c0jm01720e |
| Language: | English |
| Keywords: | CHEMICAL-VAPOR-DEPOSITION, INDUCED HYDROGEN-PRODUCTION, TRANSPORT-PROPERTIES, MOLECULAR-STRUCTURE, RAMAN-SPECTROSCOPY, OPTICAL-PROPERTIES, OXIDE-FILMS, SILLENITES, GROWTH, PT/BI2O3/RUO2 |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery-pp.ucl.ac.uk/id/eprint/143126 |
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