UCL Discovery Stage
UCL home » Library Services » Electronic resources » UCL Discovery Stage

In situ mass spectrometry analysis of chemical vapour deposition of TiO2 thin films to study gas phase mechanisms

Blackburn, BJ; Drosos, C; Brett, DB; Parkes, MA; Carmalt, CJ; Parkin, IP; (2016) In situ mass spectrometry analysis of chemical vapour deposition of TiO2 thin films to study gas phase mechanisms. RSC Advances , 6 (113) pp. 111797-111805. 10.1039/c6ra22801a. Green open access

[thumbnail of Carmnalt_RSC Avd- In-situ Mass Analysis of Chemical Vapour Deposition of TiO2 Thin Films (corrected manuscript)CC.pdf]
Preview
Text
Carmnalt_RSC Avd- In-situ Mass Analysis of Chemical Vapour Deposition of TiO2 Thin Films (corrected manuscript)CC.pdf

Download (1MB) | Preview

Abstract

Deposition of TiO2 thin films are studied using a newly developed in situ mass spectrometry technique to observe gas phase reactions. Atmospheric pressure chemical vapour deposition (APCVD) reactions were carried out using titanium chloride and titanium tetraisopropoxide precursors, with ethyl acetate acting as an oxygen source in the case of the former, depositing on to float glass substrates at 300 and 600 °C. Using an atmospheric sampling mass spectrometer, the vapour phase was analysed during deposition and signals assigned to intermediate species that were measured during the formation of the thin films. The films deposited were characterised via scanning electron microscopy, X-ray photoelectron spectroscopy and thin film X-ray diffraction analysis.

Type: Article
Title: In situ mass spectrometry analysis of chemical vapour deposition of TiO2 thin films to study gas phase mechanisms
Open access status: An open access version is available from UCL Discovery
DOI: 10.1039/c6ra22801a
Publisher version: http://doi.org/10.1039/c6ra22801a
Language: English
Additional information: © The Royal Society of Chemistry 2016
Keywords: Science & Technology, Physical Sciences, Chemistry, Multidisciplinary, Chemistry, LIGHT PHOTOCATALYTIC ACTIVITY, ATMOSPHERIC-PRESSURE CVD, DIAMOND GROWTH-MECHANISM, ATOMIC LAYER DEPOSITION, TITANIUM-DIOXIDE, SOLAR-CELLS, APCVD, TEMPERATURE, COATINGS, MICROSTRUCTURE
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery-pp.ucl.ac.uk/id/eprint/1534470
Downloads since deposit
11,938Downloads
Download activity - last month
Download activity - last 12 months
Downloads by country - last 12 months

Archive Staff Only

View Item View Item