Nash, CR;
(2017)
Circuit elements for quantum phase-slip devices.
Doctoral thesis , UCL (University College London).
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Abstract
If proved to exist, the phenomenon of quantum phase slips (QPS) allows us to provide a new standard for current. In order to investigate this effect a QPS circuit needs to be constructed with a superconducting nanowire connected in series with an inductor and two thin film resistors. It was found that it was possible to control the low temperature resistance of chromium oxide films by increasing the oxygen pressure at the time of deposition, meaning chromium oxide films could be fabricated for a large resistance range of thin film resistors, from values in the hundreds of ohms to megaohms. These films were found to be amorphous when measured with XRD and displayed extremely low magnetoresistance (with a peak magnetic moment of 5x10 3 μB per atom, compared to 2 μB per atom in bulk ferro- magnetic Cr2O3). The contact resistance of joining these chromium oxide resistors to gold or niobium-silicon was measured using a transmission-line model and this revealed that a gold interlayer provided a much lower contact resistance than direct contact of the circuit components (a contact resistivity of 0.15 m Ohm cm2 for chromium oxide to gold compared to 65 m Ohm cm2 for chromium oxide to niobium silicon). Several methods were used to restrict nanowire dimensions. It was found that combining a HSQ fabrication method with a neon mill resulted in the creation of wires below the coherence length of niobium nitride (30 nm), which made these wires suitable for QPS measurements.
Type: | Thesis (Doctoral) |
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Title: | Circuit elements for quantum phase-slip devices |
Event: | University College London |
Open access status: | An open access version is available from UCL Discovery |
Language: | English |
Additional information: | Third party copyright material has been removed from ethesis. |
Keywords: | Phase-slips, Chromium Oxide, Quantum Phase-Slips, thin film resistors, superconducting nanowires, Niobium Sillicon, Niobium Nitride, Electron Beam Lithography, Current Standard |
UCL classification: | UCL > Provost and Vice Provost Offices UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
URI: | https://discovery-pp.ucl.ac.uk/id/eprint/1558026 |
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